Autor segons l'article: Butt, M. A.; Sole, R.; Pujol, M. C.; Rodenas, A.; Lifante, G.; Choudhary, A.; Murugan, G. S.; Shepherd, D. P.; Wilkinson, J. S.; Aguilo, M.; Diaz, F.;
Departament: Química Física i Inorgànica
Autor/s de la URV: Aguiló Díaz, Magdalena / Díaz González, Francisco Manuel / Pujol Baiges, Maria Cinta / RODENAS SEGUI, AIRAN / Solé Cartañà, Rosa Maria
Paraules clau: Wave-guides Titanyl phosphate Reactive ion etching Rbtiopo4 Rbtiopo 4 Rbtiopo 4 Rbtioaso4 Optical waves Niobium Ktiopo4 Integrated optical materials Growth Crystals
Resum: Reactive ion etching of RbTiOPO4 (0 0 1) substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers has been performed using fluorine chemistry. A maximum etch rate of 8.7 nm/min was obtained, and the deepest etch achieved was 3.5 mu m. The (Yb,Nb)-doped epitaxial layers showed a slower etching rate when compared with undoped material. Liquid phase epitaxial growth of cladding layers has also been performed, resulting in a high-quality interface growth without appreciable defects. 9-mm-long Mach-Zehnder interferometer and 9-mm-long Y-splitter structures were designed and patterned in RbTiOPO4 substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers. The structures fabricated in RbTiOPO4 substrates were filled with laser active (Yb,Nb):RbTiOPO4 higher refractive index core material, and finally an RbTiOPO4 cladding was grown on the samples. The refractive index difference between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.5 mu m has been measured and optical waveguiding at this wavelength has been demonstrated.
Àrees temàtiques: Telecommunications Química Optics Odontología Matemática / probabilidade e estatística Interdisciplinar Engineering, electrical & electronic Engenharias iv Engenharias iii Ciência da computação Atomic and molecular physics, and optics Astronomia / física
Accès a la llicència d'ús: https://creativecommons.org/licenses/by/3.0/es/
Adreça de correu electrònic de l'autor: f.diaz@urv.cat rosam.sole@urv.cat mariacinta.pujol@urv.cat magdalena.aguilo@urv.cat
Identificador de l'autor: 0000-0003-4581-4967 0000-0002-5769-4141 0000-0002-1052-8031 0000-0001-6130-9579
Data d'alta del registre: 2024-04-27
Versió de l'article dipositat: info:eu-repo/semantics/acceptedVersion
Enllaç font original: https://ieeexplore.ieee.org/document/6980107
URL Document de llicència: http://repositori.urv.cat/ca/proteccio-de-dades/
Referència a l'article segons font original: Journal Of Lightwave Technology. 33 (9): 1863-1871
Referència de l'ítem segons les normes APA: Butt, M. A.; Sole, R.; Pujol, M. C.; Rodenas, A.; Lifante, G.; Choudhary, A.; Murugan, G. S.; Shepherd, D. P.; Wilkinson, J. S.; Aguilo, M.; Diaz, F.; (2015). Fabrication of Y-Splitters and Mach-Zehnder Structures on (Yb,Nb):RbTiOPO4/RbTiOPO4 Epitaxial Layers by Reactive Ion Etching. Journal Of Lightwave Technology, 33(9), 1863-1871. DOI: 10.1109/JLT.2014.2379091
DOI de l'article: 10.1109/JLT.2014.2379091
Entitat: Universitat Rovira i Virgili
Any de publicació de la revista: 2015
Tipus de publicació: Journal Publications
Repositori URV