Autor según el artículo: Magdalena Aguiló; Muhammad Ali Butt; Huu-Dat Nguyen; Airán Ródenas; Carolina Romero; Pablo Moreno; Javier R. Vázquez de Aldana; Rosa Maria Solé; Maria Cinta Pujol; Francesc Díaz
Departamento: Química Física i Inorgànica
Autor/es de la URV: AGUILÓ DÍAZ, MAGDALENA; Muhammad Ali Butt; Huu-Dat Nguyen; Airán Ródenas; Carolina Romero; Pablo Moreno; Javier R. Vázquez de Aldana; SOLÉ CARTAÑÀ, ROSA MARIA; PUJOL BAIGES, MARIA CINTA; DÍAZ GONZÁLEZ, FRANCISCO MANUEL
Resumen: We report on the direct low-repetition rate femtosecond pulse laser microfabrication of optical waveguides in KTP crystals and the characterization of refractive index changes after the thermal annealing of the sample, with the focus on studying the potential for direct laser fabricating Mach-Zehnder optical modulators. We have fabricated square cladding waveguides by means of stacking damage tracks, and found that the refractive index decrease is large for vertically polarized light (c-axis; TM polarized) but rather weak for horizontally polarized light (a-axis; TE polarized), this leading to good near-infrared light confinement for TM modes but poor for TE modes. However, after performing a sample thermal annealing we have found that the thermal process enables a refractive index increment of around 1.5x10−3 for TE polarized light, while maintaining the negative index change of around −1x10−2 for TM polarized light. In order to evaluate the local refractive index changes we have followed a multistep procedure: We have first characterized the waveguide cross-sections by means of Raman micro-mapping to access the lattice micro-modifications and their spatial extent. Secondly we have modeled the waveguides following the modified region sizes obtained by micro-Raman with finite element method software to obtain a best match between the experimental propagation modes and the simulated ones. Furthermore we also report the fabrication of Mach-Zehnder structures and the evaluation of propagation losses.
Grupo de investigación: Física i Cristal.lografia de Materials Física i Cristal·lografia de Nanomaterials
Áreas temáticas: Química Química Chemistry
Acceso a la licencia de uso: https://creativecommons.org/licenses/by/3.0/es/
ISSN: 1094-4087
Identificador del autor: 0000-0001-6130-9579; ; ; ; ; ; ; 0000-0002-5769-4141; 0000-0002-1052-8031; 0000-0003-4581-4967
Fecha de alta del registro: 2017-05-25
Página final: 15355
Volumen de revista: 23
Versión del articulo depositado: info:eu-repo/semantics/publishedVersion
Enlace a la fuente original: https://www.osapublishing.org/oe/abstract.cfm?uri=oe-23-12-15343
Programa de financiación: plan; Retas/FIS; FIS2013-44174-P;MAT2013-47395-C4-4-R;TEC2014-55948-R
URL Documento de licencia: https://repositori.urv.cat/ca/proteccio-de-dades/
DOI del artículo: 10.1364/OE.23.015343
Entidad: Universitat Rovira i Virgili
Año de publicación de la revista: 2016
Página inicial: 15343
Tipo de publicación: Article Artículo Article
Repositori URV