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Nickel Doped WO3Nanoneedles Deposited by a Single Step AACVD for Gas Sensing Applications

  • Dades identificatives

    Identificador: imarina:5610360
    Autors:
    Vilic, ToniLlobet, Eduard
    Resum:
    © 2016 The Authors. One-step Aerosol Assisted Chemical Vapour Deposition (AACVD) method was used for the first time to grow WO3nanoneedles (NNs) decorated with NiO metal nanoparticles (NPs) at lower (380°C) deposition temperature. This co-deposition method is demonstrated to be an effective route to incorporate metal NPs into nanostructured materials. A layer of needle-like tungsten oxide film was deposited directly onto transducer alumina substrates from W(CO)6and Ni(acac)2precursors. Moreover, the systematic growth study of WO3NNs + metal NPs allowed the identification of the parameters required for the formation of nanostructured sensing materials having different metal precursor concentration in a range of 2.5 to 15 mg The results show variations in the sensing properties according to the metal precursor concentration. Improved sensing, to some reducing gases, such as EtOH, H2S and NH3are observed at 200°C with lower doped tungsten oxide films, whereas higher doped tungsten oxide has shown no response.
  • Altres:

    Autor segons l'article: Vilic, Toni; Llobet, Eduard
    Departament: Enginyeria Electrònica, Elèctrica i Automàtica
    Autor/s de la URV: Llobet Valero, Eduard / VILIC, TONI TRAYCHOVA
    Paraules clau: Nickel doped Nanoneedles Gas sensor Aacvd
    Resum: © 2016 The Authors. One-step Aerosol Assisted Chemical Vapour Deposition (AACVD) method was used for the first time to grow WO3nanoneedles (NNs) decorated with NiO metal nanoparticles (NPs) at lower (380°C) deposition temperature. This co-deposition method is demonstrated to be an effective route to incorporate metal NPs into nanostructured materials. A layer of needle-like tungsten oxide film was deposited directly onto transducer alumina substrates from W(CO)6and Ni(acac)2precursors. Moreover, the systematic growth study of WO3NNs + metal NPs allowed the identification of the parameters required for the formation of nanostructured sensing materials having different metal precursor concentration in a range of 2.5 to 15 mg The results show variations in the sensing properties according to the metal precursor concentration. Improved sensing, to some reducing gases, such as EtOH, H2S and NH3are observed at 200°C with lower doped tungsten oxide films, whereas higher doped tungsten oxide has shown no response.
    Àrees temàtiques: Química Odontología Medicina ii Medicina i Materiais Interdisciplinar General engineering Farmacia Engineering (miscellaneous) Engineering (all) Engenharias iv Engenharias iii Engenharias ii Enfermagem Ciências biológicas iii Ciências biológicas ii Ciências biológicas i Ciências ambientais Ciência de alimentos Biotecnología Astronomia / física Arquitetura, urbanismo e design Arquitetura e urbanismo
    Accès a la llicència d'ús: https://creativecommons.org/licenses/by/3.0/es/
    Adreça de correu electrònic de l'autor: eduard.llobet@urv.cat
    Identificador de l'autor: 0000-0001-6164-4342
    Data d'alta del registre: 2024-10-12
    Versió de l'article dipositat: info:eu-repo/semantics/publishedVersion
    Enllaç font original: https://www.sciencedirect.com/science/article/pii/S1877705816334737
    URL Document de llicència: https://repositori.urv.cat/ca/proteccio-de-dades/
    Referència a l'article segons font original: Procedia Engineering. 168 206-210
    Referència de l'ítem segons les normes APA: Vilic, Toni; Llobet, Eduard (2016). Nickel Doped WO3Nanoneedles Deposited by a Single Step AACVD for Gas Sensing Applications. Amsterdam: Elsevier
    DOI de l'article: 10.1016/j.proeng.2016.11.163
    Entitat: Universitat Rovira i Virgili
    Any de publicació de la revista: 2016
    Tipus de publicació: Proceedings Paper
  • Paraules clau:

    Engineering (Miscellaneous)
    Nickel doped
    Nanoneedles
    Gas sensor
    Aacvd
    Química
    Odontología
    Medicina ii
    Medicina i
    Materiais
    Interdisciplinar
    General engineering
    Farmacia
    Engineering (miscellaneous)
    Engineering (all)
    Engenharias iv
    Engenharias iii
    Engenharias ii
    Enfermagem
    Ciências biológicas iii
    Ciências biológicas ii
    Ciências biológicas i
    Ciências ambientais
    Ciência de alimentos
    Biotecnología
    Astronomia / física
    Arquitetura, urbanismo e design
    Arquitetura e urbanismo
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