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Nickel Doped WO3Nanoneedles Deposited by a Single Step AACVD for Gas Sensing Applications

  • Datos identificativos

    Identificador: imarina:5610360
    Autores:
    Vilic, ToniLlobet, Eduard
    Resumen:
    © 2016 The Authors. One-step Aerosol Assisted Chemical Vapour Deposition (AACVD) method was used for the first time to grow WO3nanoneedles (NNs) decorated with NiO metal nanoparticles (NPs) at lower (380°C) deposition temperature. This co-deposition method is demonstrated to be an effective route to incorporate metal NPs into nanostructured materials. A layer of needle-like tungsten oxide film was deposited directly onto transducer alumina substrates from W(CO)6and Ni(acac)2precursors. Moreover, the systematic growth study of WO3NNs + metal NPs allowed the identification of the parameters required for the formation of nanostructured sensing materials having different metal precursor concentration in a range of 2.5 to 15 mg The results show variations in the sensing properties according to the metal precursor concentration. Improved sensing, to some reducing gases, such as EtOH, H2S and NH3are observed at 200°C with lower doped tungsten oxide films, whereas higher doped tungsten oxide has shown no response.
  • Otros:

    Autor según el artículo: Vilic, Toni; Llobet, Eduard
    Departamento: Enginyeria Electrònica, Elèctrica i Automàtica
    Autor/es de la URV: Llobet Valero, Eduard / VILIC, TONI TRAYCHOVA
    Palabras clave: Nickel doped Nanoneedles Gas sensor Aacvd
    Resumen: © 2016 The Authors. One-step Aerosol Assisted Chemical Vapour Deposition (AACVD) method was used for the first time to grow WO3nanoneedles (NNs) decorated with NiO metal nanoparticles (NPs) at lower (380°C) deposition temperature. This co-deposition method is demonstrated to be an effective route to incorporate metal NPs into nanostructured materials. A layer of needle-like tungsten oxide film was deposited directly onto transducer alumina substrates from W(CO)6and Ni(acac)2precursors. Moreover, the systematic growth study of WO3NNs + metal NPs allowed the identification of the parameters required for the formation of nanostructured sensing materials having different metal precursor concentration in a range of 2.5 to 15 mg The results show variations in the sensing properties according to the metal precursor concentration. Improved sensing, to some reducing gases, such as EtOH, H2S and NH3are observed at 200°C with lower doped tungsten oxide films, whereas higher doped tungsten oxide has shown no response.
    Áreas temáticas: Química Odontología Medicina ii Medicina i Materiais Interdisciplinar General engineering Farmacia Engineering (miscellaneous) Engineering (all) Engenharias iv Engenharias iii Engenharias ii Enfermagem Ciências biológicas iii Ciências biológicas ii Ciências biológicas i Ciências ambientais Ciência de alimentos Biotecnología Astronomia / física Arquitetura, urbanismo e design Arquitetura e urbanismo
    Acceso a la licencia de uso: https://creativecommons.org/licenses/by/3.0/es/
    Direcció de correo del autor: eduard.llobet@urv.cat
    Identificador del autor: 0000-0001-6164-4342
    Fecha de alta del registro: 2024-10-12
    Versión del articulo depositado: info:eu-repo/semantics/publishedVersion
    Enlace a la fuente original: https://www.sciencedirect.com/science/article/pii/S1877705816334737
    URL Documento de licencia: https://repositori.urv.cat/ca/proteccio-de-dades/
    Referencia al articulo segun fuente origial: Procedia Engineering. 168 206-210
    Referencia de l'ítem segons les normes APA: Vilic, Toni; Llobet, Eduard (2016). Nickel Doped WO3Nanoneedles Deposited by a Single Step AACVD for Gas Sensing Applications. Amsterdam: Elsevier
    DOI del artículo: 10.1016/j.proeng.2016.11.163
    Entidad: Universitat Rovira i Virgili
    Año de publicación de la revista: 2016
    Tipo de publicación: Proceedings Paper
  • Palabras clave:

    Engineering (Miscellaneous)
    Nickel doped
    Nanoneedles
    Gas sensor
    Aacvd
    Química
    Odontología
    Medicina ii
    Medicina i
    Materiais
    Interdisciplinar
    General engineering
    Farmacia
    Engineering (miscellaneous)
    Engineering (all)
    Engenharias iv
    Engenharias iii
    Engenharias ii
    Enfermagem
    Ciências biológicas iii
    Ciências biológicas ii
    Ciências biológicas i
    Ciências ambientais
    Ciência de alimentos
    Biotecnología
    Astronomia / física
    Arquitetura, urbanismo e design
    Arquitetura e urbanismo
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