Author, as appears in the article.: Butt, M. A.; Sole, R.; Pujol, M. C.; Rodenas, A.; Lifante, G.; Choudhary, A.; Murugan, G. S.; Shepherd, D. P.; Wilkinson, J. S.; Aguilo, M.; Diaz, F.;
Department: Química Física i Inorgànica
URV's Author/s: Aguiló Díaz, Magdalena / Díaz González, Francisco Manuel / Pujol Baiges, Maria Cinta / RODENAS SEGUI, AIRAN / Solé Cartañà, Rosa Maria
Keywords: Wave-guides Titanyl phosphate Reactive ion etching Rbtiopo4 Rbtiopo 4 Rbtiopo 4 Rbtioaso4 Optical waves Niobium Ktiopo4 Integrated optical materials Growth Crystals
Abstract: Reactive ion etching of RbTiOPO4 (0 0 1) substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers has been performed using fluorine chemistry. A maximum etch rate of 8.7 nm/min was obtained, and the deepest etch achieved was 3.5 mu m. The (Yb,Nb)-doped epitaxial layers showed a slower etching rate when compared with undoped material. Liquid phase epitaxial growth of cladding layers has also been performed, resulting in a high-quality interface growth without appreciable defects. 9-mm-long Mach-Zehnder interferometer and 9-mm-long Y-splitter structures were designed and patterned in RbTiOPO4 substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers. The structures fabricated in RbTiOPO4 substrates were filled with laser active (Yb,Nb):RbTiOPO4 higher refractive index core material, and finally an RbTiOPO4 cladding was grown on the samples. The refractive index difference between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.5 mu m has been measured and optical waveguiding at this wavelength has been demonstrated.
Thematic Areas: Telecommunications Química Optics Odontología Matemática / probabilidade e estatística Interdisciplinar Engineering, electrical & electronic Engenharias iv Engenharias iii Ciência da computação Atomic and molecular physics, and optics Astronomia / física
licence for use: https://creativecommons.org/licenses/by/3.0/es/
Author's mail: magdalena.aguilo@urv.cat mariacinta.pujol@urv.cat rosam.sole@urv.cat f.diaz@urv.cat
Author identifier: 0000-0001-6130-9579 0000-0002-1052-8031 0000-0002-5769-4141 0000-0003-4581-4967
Record's date: 2024-09-07
Papper version: info:eu-repo/semantics/acceptedVersion
Licence document URL: https://repositori.urv.cat/ca/proteccio-de-dades/
Papper original source: Journal Of Lightwave Technology. 33 (9): 1863-1871
APA: Butt, M. A.; Sole, R.; Pujol, M. C.; Rodenas, A.; Lifante, G.; Choudhary, A.; Murugan, G. S.; Shepherd, D. P.; Wilkinson, J. S.; Aguilo, M.; Diaz, F.; (2015). Fabrication of Y-Splitters and Mach-Zehnder Structures on (Yb,Nb):RbTiOPO4/RbTiOPO4 Epitaxial Layers by Reactive Ion Etching. Journal Of Lightwave Technology, 33(9), 1863-1871. DOI: 10.1109/JLT.2014.2379091
Entity: Universitat Rovira i Virgili
Journal publication year: 2015
Publication Type: Journal Publications
Repositori URV