Articles producció científica> Química Física i Inorgànica

Rectifiers, MOS diodes and LEDs made of fully porous GaN produced by chemical vapor deposition.

  • Datos identificativos

    Identificador: PC:3253
    Autores:
    Carvajal, J. J.Mena, J.Aixart, J.O'Dwyer, C.Díaz, F.Aguió, M.
    Resumen:
    Here we present the fabrication of LEDs based on porous GaN produced by chemical vapor deposition (CVD) and reviewed the work done that allowed demonstrating p-n junction rectifiers and MOS diodes in a simple manner and without involving post-growth steps to induce porosity. p-n junction rectifiers exhibited stable rectification in the range ±1¿±5 V, with very stable values of current with time. MOS diodes were fabricated in a single growth step formed by a MgO dielectric interlayer in between Mg-doped porous GaN and a Mg-Ga metallic alloy. Despite the high resistivity observed in the LEDs fabricated, that induced a turn on voltage of ¿13 V, the emission consisted only in one peak centered at 542 nm. Our porous GaN films exhibit random porosity when compared to arrays of nanostructures, however, their easy deposition over large areas without dominating leakage currents is promising for wideband gap applications.
  • Otros:

    Autor según el artículo: Carvajal, J. J. ; Mena, J. ; Aixart, J. ; O'Dwyer, C. ; Díaz, F.; Aguió, M.
    Departamento: Química Física i Inorgànica
    Autor/es de la URV: CARVAJAL MARTÍ, JOAN JOSEP; Mena, J. ; Aixart, J. ; O'Dwyer, C. ; DÍAZ GONZÁLEZ, FRANCISCO MANUEL; AGUILÓ DÍAZ, MAGDALENA
    Palabras clave: MOS Diodes LED GaN
    Resumen: Here we present the fabrication of LEDs based on porous GaN produced by chemical vapor deposition (CVD) and reviewed the work done that allowed demonstrating p-n junction rectifiers and MOS diodes in a simple manner and without involving post-growth steps to induce porosity. p-n junction rectifiers exhibited stable rectification in the range ±1¿±5 V, with very stable values of current with time. MOS diodes were fabricated in a single growth step formed by a MgO dielectric interlayer in between Mg-doped porous GaN and a Mg-Ga metallic alloy. Despite the high resistivity observed in the LEDs fabricated, that induced a turn on voltage of ¿13 V, the emission consisted only in one peak centered at 542 nm. Our porous GaN films exhibit random porosity when compared to arrays of nanostructures, however, their easy deposition over large areas without dominating leakage currents is promising for wideband gap applications.
    Grupo de investigación: Física i Cristal.lografia de Materials Física i Cristal·lografia de Nanomaterials
    Áreas temáticas: Química Química Chemistry
    Acceso a la licencia de uso: https://creativecommons.org/licenses/by/3.0/es/
    ISSN: 2162-8769
    Identificador del autor: 0000-0002-4389-7298; ; ; ; 0000-0003-4581-4967; 0000-0001-6130-9579
    Fecha de alta del registro: 2018-06-04
    Página final: 148
    Volumen de revista: 6
    Versión del articulo depositado: info:eu-repo/semantics/submittedVersion
    Enlace a la fuente original: https://iopscience.iop.org/article/10.1149/2.0041710jss
    Programa de financiación: plan; Retos; TEC2014-55948-R plan; Retos; Mineco/AEI/FEDER MAT2016-75716-C2-1-R altres; Grupos consolidados; 2014SGR1358 altres; Icrea Academia; 2010ICREA-02 altres; Science Foundation Ireland research grant from SFI; 15/TIDA/2893 altres; Science Foundation Ireland research grant from SFI; 14/IA/2581.
    URL Documento de licencia: https://repositori.urv.cat/ca/proteccio-de-dades/
    DOI del artículo: 10.1149/2.0041710jss
    Entidad: Universitat Rovira i Virgili
    Año de publicación de la revista: 2017
    Página inicial: 143
    Tipo de publicación: Article Artículo Article
  • Palabras clave:

    Díodes electroluminescents
    Nitrur de gal·li
    MOS Diodes
    LED
    GaN
    Química
    Química
    Chemistry
    2162-8769
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