Tesis doctorals> Departament d'Enginyeria Electrònica, Elèctrica i Automàtica

Analytical predictive 2d modeling of pinch-off behavior in nanoscale multi-gate mosfets

  • Dades identificatives

    Identificador: TDX:1012
    Autors:
    Weidemann, Michaela Patricia
    Resum:
    In this thesis the pinch-off behavior in nanoscale Multi-Gate MOSFETs was reviewed and with compact models described. For this a 2D approach with Schwarz-Christoffel conformal mapping technique was used. A model to calculate the current in single gate MOSFETs was derived and compared to device simulations from TCAD Sentaurus down to 50nm. For the DoubleGate MOSFET a new way to define the saturation point was found. A fully 2D closed-form model to locate this point was created. It was also found that with quantum mechanics effects a pinch-off point can occur and can be described with the same model. Furthermore the model was extended to describe the coupled pinch-off points in an asymmetrical biased DoubleGate MOSET with an even an odd mode. Also the saturation point behavior in FinFETs was examinated.
  • Altres:

    Data: 2011-01-12
    Departament/Institut: Departament d'Enginyeria Electrònica, Elèctrica i Automàtica Universitat Rovira i Virgili.
    Idioma: eng
    Identificador: http://hdl.handle.net/10803/52800
    Font: TDX (Tesis Doctorals en Xarxa)
    Autor: Weidemann, Michaela Patricia
    Director: Íñiguez Nicolau, Benjamí Kloes, Alexander
    Format: application/pdf 144 p.
    Editor: Universitat Rovira i Virgili
    Paraula Clau: Mosfet Multi-gate Nanoscale Modeling
    Títol: Analytical predictive 2d modeling of pinch-off behavior in nanoscale multi-gate mosfets
    Matèria: 621.3 - Enginyeria elèctrica. Electrotècnia. Telecomunicacions
  • Paraules clau:

    621.3 - Enginyeria elèctrica. Electrotècnia. Telecomunicacions
  • Documents:

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