The cluster model configuration interaction approach to the study of chemisorption on metal and semiconductor surfaces

APA: ILLAS, F; RUBIO, J; RICART, JM (1993). The cluster model configuration interaction approach to the study of chemisorption on metal and semiconductor surfaces. Journal Of Molecular Structure: Theochem, 287(C), 167-178. DOI: 10.1016/0166-1280(93)87219-4

Paper original source: Journal Of Molecular Structure: Theochem. 287 (C): 167-178

Article's DOI: 10.1016/0166-1280(93)87219-4

Journal publication year: 1993

Entity: Universitat Rovira i Virgili

Record's date: 2025-02-19

URV's Author/s: Ricart Pla, Jose Manuel

Department: Química Física i Inorgànica

Licence document URL: https://repositori.urv.cat/ca/proteccio-de-dades/

Publication Type: Journal Publications

ISSN: 01661280

Author, as appears in the article.: ILLAS, F; RUBIO, J; RICART, JM

Thematic Areas: Química, Medicina ii, Materiais, Interdisciplinar, Farmacia, Engenharias iv, Engenharias iii, Engenharias ii, Educação física, Ciências biológicas iii, Ciências biológicas ii, Ciências biológicas i, Ciências agrárias i, Ciência de alimentos, Chemistry, physical, Biotecnología, Biodiversidade, Astronomia / física

Author's mail: josep.ricart@urv.cat