Articles producció científicaEnginyeria Electrònica, Elèctrica i Automàtica

Compact drain-current model for undoped cylindrical surrounding-gate metal-oxide-semiconductor field effect transistors including short channel effects

  • Datos identificativos

    Identificador:  imarina:9285360
    Autores:  Smaani, B; Latreche, S; Iñiguez, B
    Resumen:
    In this paper, we present a compact model for undoped short-channel cylindrical surrounding-gate MOSFETs. The drain-current model is expressed as a function of the mobile charge density, which is calculated using the analytical expressions of the surface potential and the difference between surface and center potentials model. The short-channel effects are well incorporated in the drain-current model, such as the drain-induced barrier lowering, the charge sharing effect (VT Roll-off), the subthreshold slope degradation, and the channel length modulation. A comparison of the model results with 3D numerical simulations using Silvaco Atlas-TCAD presents a good agreement from subthreshold to strong inversion regime and for different bias voltages. © 2013 AIP Publishing LLC.
  • Otros:

    Enlace a la fuente original: https://aip.scitation.org/doi/10.1063/1.4844395
    Referencia de l'ítem segons les normes APA: Smaani, B; Latreche, S; Iñiguez, B (2013). Compact drain-current model for undoped cylindrical surrounding-gate metal-oxide-semiconductor field effect transistors including short channel effects. Journal Of Applied Physics, 114(22), 224507-. DOI: 10.1063/1.4844395
    Referencia al articulo segun fuente origial: Journal Of Applied Physics. 114 (22): 224507-
    DOI del artículo: 10.1063/1.4844395
    Año de publicación de la revista: 2013-12-14
    Entidad: Universitat Rovira i Virgili
    Versión del articulo depositado: info:eu-repo/semantics/publishedVersion
    Fecha de alta del registro: 2026-05-09
    Autor/es de la URV: Iñiguez Nicolau, Benjamin
    Departamento: Enginyeria Electrònica, Elèctrica i Automàtica
    URL Documento de licencia: https://repositori.urv.cat/ca/proteccio-de-dades/
    Tipo de publicación: Journal Publications
    Autor según el artículo: Smaani, B; Latreche, S; Iñiguez, B
    Acceso a la licencia de uso: https://creativecommons.org/licenses/by/3.0/es/
    Áreas temáticas: Physics, applied, Physics and astronomy (miscellaneous), Physics and astronomy (all), General physics and astronomy, Engenharias iii, Condensed matter physics, Ciências agrárias i, Atomic and molecular physics, and optics, Astronomia / física
    Direcció de correo del autor: benjamin.iniguez@urv.cat, benjamin.iniguez@urv.cat
  • Palabras clave:

    Physics
    Physical properties
    Metal oxide semiconductor field-effect transistors
    Field effect transistors
    Drain-induced barrier lowering
    Drain-current modeling
    Cylindrical surrounding-gate
    Charge sharing effects
    Channel length modulation
    Analytical expressions
    3-d numerical simulation
    Atomic and Molecular Physics
    and Optics
    Condensed Matter Physics
    Physics and Astronomy (Miscellaneous)
    Applied
    Physics and astronomy (all)
    General physics and astronomy
    Engenharias iii
    Ciências agrárias i
    Astronomia / física
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