Articles producció científica> Enginyeria Electrònica, Elèctrica i Automàtica

DC self-heating effects modelling in SOI and bulk FinFETs

  • Datos identificativos

    Identificador: imarina:9285434
    Autores:
    González BRoldán JBIñiguez BLázaro ACerdeira A
    Resumen:
    DC thermal effects modelling for nanometric silicon-on-insulator (SOI) and bulk fin-shaped field-effect transistors (FinFETs) is presented. Among other features, the model incorporates self-heating effects (SHEs), velocity saturation and short-channel effects. SHEs are analysed in depth by means of thermal resistances, which are determined through an equivalent thermal circuit, accounting for the degraded thermal conductivity of the ultrathin films within the device. Once the thermal resistance for single-fin devices has been validated for different gate lengths and biases, comparing the modelled output characteristics and device temperatures with numerical simulations obtained using Sentaurus Device, the thermal model is extended by circuital analysis to multi-fin devices with multiple fingers. © 2015 Elsevier Ltd. All rights reserved.
  • Otros:

    Autor según el artículo: González B; Roldán JB; Iñiguez B; Lázaro A; Cerdeira A
    Departamento: Enginyeria Electrònica, Elèctrica i Automàtica
    Autor/es de la URV: Iñiguez Nicolau, Benjamin / Lázaro Guillén, Antonio Ramon
    Palabras clave: Velocity saturation Ultrathin films Thermal resistance Thermal conductivity Silicon-on- insulators (soi) Silicon on insulator technology Short-channel effect Self-heating effects (sse) Self-heating effect Output characteristics Mosfet devices Integrated circuits Heat resistance Fins (heat exchange) Fin-shaped field-effect transistor (finfet) Field effect transistors Equivalent thermal circuits Compact modelling
    Resumen: DC thermal effects modelling for nanometric silicon-on-insulator (SOI) and bulk fin-shaped field-effect transistors (FinFETs) is presented. Among other features, the model incorporates self-heating effects (SHEs), velocity saturation and short-channel effects. SHEs are analysed in depth by means of thermal resistances, which are determined through an equivalent thermal circuit, accounting for the degraded thermal conductivity of the ultrathin films within the device. Once the thermal resistance for single-fin devices has been validated for different gate lengths and biases, comparing the modelled output characteristics and device temperatures with numerical simulations obtained using Sentaurus Device, the thermal model is extended by circuital analysis to multi-fin devices with multiple fingers. © 2015 Elsevier Ltd. All rights reserved.
    Áreas temáticas: Surfaces, coatings and films Nanoscience and nanotechnology Nanoscience & nanotechnology Medicina ii Materiais Interdisciplinar Farmacia Ensino Engineering, electrical & electronic Engenharias iv Engenharias iii Engenharias ii Electronic, optical and magnetic materials Electrical and electronic engineering Condensed matter physics Ciências biológicas ii Ciências biológicas i Ciência da computação Biodiversidade Atomic and molecular physics, and optics Astronomia / física Artes
    Acceso a la licencia de uso: https://creativecommons.org/licenses/by/3.0/es/
    Direcció de correo del autor: antonioramon.lazaro@urv.cat benjamin.iniguez@urv.cat
    Identificador del autor: 0000-0003-3160-5777 0000-0002-6504-7980
    Fecha de alta del registro: 2024-07-27
    Versión del articulo depositado: info:eu-repo/semantics/acceptedVersion
    Enlace a la fuente original: https://www.sciencedirect.com/science/article/abs/pii/S0026269215000397
    URL Documento de licencia: https://repositori.urv.cat/ca/proteccio-de-dades/
    Referencia al articulo segun fuente origial: Microelectronics Journal. 46 (4): 320-326
    Referencia de l'ítem segons les normes APA: González B; Roldán JB; Iñiguez B; Lázaro A; Cerdeira A (2015). DC self-heating effects modelling in SOI and bulk FinFETs. Microelectronics Journal, 46(4), 320-326. DOI: 10.1016/j.mejo.2015.02.003
    DOI del artículo: 10.1016/j.mejo.2015.02.003
    Entidad: Universitat Rovira i Virgili
    Año de publicación de la revista: 2015
    Tipo de publicación: Journal Publications
  • Palabras clave:

    Atomic and Molecular Physics, and Optics,Condensed Matter Physics,Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials,Engineering, Electrical & Electronic,Nanoscience & Nanotechnology,Nanoscience and Nanotechnology,Surfaces, Coatings and Films
    Velocity saturation
    Ultrathin films
    Thermal resistance
    Thermal conductivity
    Silicon-on- insulators (soi)
    Silicon on insulator technology
    Short-channel effect
    Self-heating effects (sse)
    Self-heating effect
    Output characteristics
    Mosfet devices
    Integrated circuits
    Heat resistance
    Fins (heat exchange)
    Fin-shaped field-effect transistor (finfet)
    Field effect transistors
    Equivalent thermal circuits
    Compact modelling
    Surfaces, coatings and films
    Nanoscience and nanotechnology
    Nanoscience & nanotechnology
    Medicina ii
    Materiais
    Interdisciplinar
    Farmacia
    Ensino
    Engineering, electrical & electronic
    Engenharias iv
    Engenharias iii
    Engenharias ii
    Electronic, optical and magnetic materials
    Electrical and electronic engineering
    Condensed matter physics
    Ciências biológicas ii
    Ciências biológicas i
    Ciência da computação
    Biodiversidade
    Atomic and molecular physics, and optics
    Astronomia / física
    Artes
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